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Effect of sputter-etching conditions on the barrier characteristics and the process-induced defects in (Ti-W)/Si Schottky diodes

✍ Scribed by D. Bauza; C. Mallardeau; Y. Morand


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
384 KB
Volume
4
Category
Article
ISSN
0921-5107

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