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Damage accumulation and dopant migration during shallow As and Sb implantation into Si

✍ Scribed by M. Werner; J.A. van den Berg; D.G. Armour; W. Vandervorst; E.H.J. Collart; R.D. Goldberg; P. Bailey; T.C.Q. Noakes

No coin nor oath required. For personal study only.

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