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Composition, structure and properties of SiNx films fabricated by pulsed reactive closed-field unbalanced magnetron sputtering

โœ Scribed by Zh.Q. Yao; P. Yang; N. Huang; H. Sun; G.J. Wan; Y.X. Leng; J.Y. Chen


Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
470 KB
Volume
240
Category
Article
ISSN
0168-583X

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The NiO x thin films were deposited by reactive dc-magnetron sputtering from a nickel metal target in Ar + O 2 with the relative O 2 content 5%. The as-deposited NiO x thin films could represent a two-component system comprising crystalline NiO particles dispersed in an amorphous Ni 2 O 3 . Decompos