Chemical vapour deposition of silanes
✍ Scribed by Ulf Jönsson; Göran Olofsson; Magnus Malmqvist; Inger Rönnberg
- Publisher
- Elsevier Science
- Year
- 1985
- Tongue
- English
- Weight
- 540 KB
- Volume
- 124
- Category
- Article
- ISSN
- 0040-6090
No coin nor oath required. For personal study only.
📜 SIMILAR VOLUMES
During low-pressure chemical vapour deposition of SiO, from a thermally activated mixture of silane and oxygen, chemiluminescence is observed. It consists of a broad band extending from the UV throughout the visible part of the spectrum and a smaller signal at 3 IO nm. These signals are ascribed to
The UV-induced photolysis of trimethyl(vinyloxy)silane (TMVSi) induced by ArF laser, affording a multitude of unsaturated hydrocarbons and a solid polydimethylsiloxane, represents a convenient process of chemical vapour deposition in which the silicon of the parent is almost completely utilized for