CO2-laser-induced chemical vapour deposition of polycrystalline silicon from silane
β Scribed by D. Tonneau; G. Auvert; Y. Pauleau
- Publisher
- Elsevier Science
- Year
- 1987
- Tongue
- English
- Weight
- 655 KB
- Volume
- 155
- Category
- Article
- ISSN
- 0040-6090
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The UV-induced photolysis of trimethyl(vinyloxy)silane (TMVSi) induced by ArF laser, affording a multitude of unsaturated hydrocarbons and a solid polydimethylsiloxane, represents a convenient process of chemical vapour deposition in which the silicon of the parent is almost completely utilized for
During low-pressure chemical vapour deposition of SiO, from a thermally activated mixture of silane and oxygen, chemiluminescence is observed. It consists of a broad band extending from the UV throughout the visible part of the spectrum and a smaller signal at 3 IO nm. These signals are ascribed to