Chemiluminescence during thermal chemical vapour deposition of SiO2 from silane-oxygen mixtures

✍ Scribed by Peter van de Weijer; Bauke H. Zwerver; Joseph L.G. Suijker

• Publisher: Elsevier Science
• Year: 1988
• Tongue: English
• Weight: 552 KB
• Volume: 153
• Category: Article
• ISSN: 0009-2614
• DOI: 10.1016/0009-2614(88)80128-3

✦ Synopsis

During low-pressure chemical vapour deposition of SiO, from a thermally activated mixture of silane and oxygen, chemiluminescence is observed. It consists of a broad band extending from the UV throughout the visible part of the spectrum and a smaller signal at 3 IO nm. These signals are ascribed to molecular oxygen and OH radicals, respectively. Evidence is presented that these species are excited in a gas-phase process, possibly the collision-induced gas-phase reaction step Si+02+02/0H~

SiOl + OT/OH*.