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Incubation Time during Chemical Vapor Deposition of Si onto SiO2 from Silane

✍ Scribed by Y. Kajikawa; T. Tsuchiya; S. Noda; H. Komiyama

Publisher: John Wiley and Sons
Year: 2004
Tongue: English
Weight: 353 KB
Volume: 10
Category: Article
ISSN: 0948-1907
DOI: 10.1002/cvde.200304165

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