Focused Electron Beam Induced Deposition of Si-Based Materials From SiOxCy to Stoichiometric SiO2: Chemical Compositions, Chemical-Etch Rates, and Deep Ultraviolet Optical Transmissions

✍ Scribed by A. Perentes; P. Hoffmann

• Publisher: John Wiley and Sons
• Year: 2007
• Tongue: English
• Weight: 63 KB
• Volume: 13
• Category: Article
• ISSN: 0948-1907
• DOI: 10.1002/cvde.200790029