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Atmospheric pressure chemical vapor deposition of SiO2-TiO2 antireflective films from [tri-(tert-butoxy)siloxy-tri-(tert-butoxy)]titanium, [tC4H9O]3Si-O-Ti[OtC4H9]3, which is a single source alkoxide precursor

✍ Scribed by Dr. Chaitanya K. Narula; Dr. Ashima Varshney; Dr. Umar Riaz


Publisher
John Wiley and Sons
Year
1996
Tongue
English
Weight
331 KB
Volume
2
Category
Article
ISSN
0948-1907

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