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Silane oxidation study: Analysis of data for SiO2 films deposited by low temperature chemical vapour deposition

✍ Scribed by C. Cobianu; C. Pavelescu

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

D.c. dielectric breakdown in SiO2 films

✍ C. Cobianu; C. Pavelescu 📂 Article 📅 1986 🏛 Elsevier Science 🌐 English ⚖ 183 KB

Efficiency of the SiH4 oxidation reactio

✍ C. Cobianu; C. Pavelescu 📂 Article 📅 1983 🏛 Elsevier Science 🌐 English ⚖ 272 KB

Etch rate behaviour of SiO2 films chemic

✍ C. Pavelescu; C. Cobianu; L. Condriuc; E. Segal 📂 Article 📅 1984 🏛 Elsevier Science 🌐 English ⚖ 249 KB

On the role of carrier gas in the deposi

✍ C. Cobianu; C. Pavelescu; E. Segal 📂 Article 📅 1987 🏛 Elsevier Science 🌐 English ⚖ 394 KB

Etch rate behaviour of SiO2 films chemic

✍ Irina Kleps; Cristian Pavelescu 📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 220 KB

High frequency C-V investigation of meta

✍ C. Pavelescu; J.P. McVittie; C. Chang; K.C. Saraswat; J.Y. Leong 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 593 KB