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UV-laser-induced photolysis of trimethyl(vinyloxy)silane for chemical vapour deposition of polysiloxane films

✍ Scribed by Akihiko Ouchi; Yoshinori Koga; Zdeněk Bastl; Josef Pola

Publisher
John Wiley and Sons
Year
1999
Tongue
English
Weight
280 KB
Volume
13
Category
Article
ISSN
0268-2605

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✦ Synopsis

The UV-induced photolysis of trimethyl(vinyloxy)silane (TMVSi) induced by ArF laser, affording a multitude of unsaturated hydrocarbons and a solid polydimethylsiloxane, represents a convenient process of chemical vapour deposition in which the silicon of the parent is almost completely utilized for the formation of the solid phase and in which the morphology and composition of the films is affected by the configuration of the substrate and laser beam.

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