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UV laser photolysis of silacyclopent-3-ene: effect of admixtures on nature of chemically vapour-deposited organosilicon films

✍ Scribed by Markéta Urbanová; Josef Pola


Publisher
John Wiley and Sons
Year
2002
Tongue
English
Weight
148 KB
Volume
16
Category
Article
ISSN
0268-2605

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The UV-induced photolysis of trimethyl(vinyloxy)silane (TMVSi) induced by ArF laser, affording a multitude of unsaturated hydrocarbons and a solid polydimethylsiloxane, represents a convenient process of chemical vapour deposition in which the silicon of the parent is almost completely utilized for