UV-laser-induced photolysis of trimethyl
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Akihiko Ouchi; Yoshinori Koga; Zdeněk Bastl; Josef Pola
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Article
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1999
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John Wiley and Sons
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English
⚖ 280 KB
The UV-induced photolysis of trimethyl(vinyloxy)silane (TMVSi) induced by ArF laser, affording a multitude of unsaturated hydrocarbons and a solid polydimethylsiloxane, represents a convenient process of chemical vapour deposition in which the silicon of the parent is almost completely utilized for