Chemical vapour deposition of selenium and tellurium films by UV laser photolysis of selenophene and tellurophene
✍ Scribed by Josef Pola; Zdeněk Bastl; Jan Šubrt<; Akihiko Ouchi
- Publisher
- John Wiley and Sons
- Year
- 2000
- Tongue
- English
- Weight
- 245 KB
- Volume
- 14
- Category
- Article
- ISSN
- 0268-2605
No coin nor oath required. For personal study only.
📜 SIMILAR VOLUMES
The UV-induced photolysis of trimethyl(vinyloxy)silane (TMVSi) induced by ArF laser, affording a multitude of unsaturated hydrocarbons and a solid polydimethylsiloxane, represents a convenient process of chemical vapour deposition in which the silicon of the parent is almost completely utilized for
## Abstract Gas‐phase photolysis of trimethoxysilane, achieved for the first time by focused ArF laser radiation at 193 nm, yields C~1,2~ hydrocarbons, methanol and carbon monoxide along with ultrafine nanostructured silicone powder possessing SiO~3~ and SiO~4~ configurations and SiH and SiOCH~3