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Laser photolysis of trimethoxysilane: chemical vapour deposition of nanostructured silicone powders with SiH and SiOCH3 bonds

✍ Scribed by Radmila Tomovská; Zdenĕk Bastl; Jaroslav Bohác̆ek; Josef Pola


Publisher
John Wiley and Sons
Year
2003
Tongue
English
Weight
250 KB
Volume
17
Category
Article
ISSN
0268-2605

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✦ Synopsis


Abstract

Gas‐phase photolysis of trimethoxysilane, achieved for the first time by focused ArF laser radiation at 193 nm, yields C~1,2~ hydrocarbons, methanol and carbon monoxide along with ultrafine nanostructured silicone powder possessing SiO~3~ and SiO~4~ configurations and SiH and SiOCH~3~ bonds. The photolytic process, resulting in efficient removal of the methyl groups, is explained as a multitude of steps involving cleavages of all the available bonds. Copyright © 2003 John Wiley & Sons, Ltd.