✦ LIBER ✦

IR laser-induced decomposition of disiloxane for chemical vapour deposition of poly(hydridosiloxane) films

✍ Scribed by Josef Pola; Markéta Urbanová; Vladislav Dřínek; Jan Šubrt; Helmut Beckers

Publisher: John Wiley and Sons
Year: 1999
Tongue: English
Weight: 143 KB
Volume: 13
Category: Article
ISSN: 0268-2605
DOI: 10.1002/(sici)1099-0739(199909)13:9<655::aid-aoc893>3.0.co;2-0

No coin nor oath required. For personal study only.

✦ Synopsis

Continuous

-wave CO 2 -laser-induced gas-phase decomposition of H 3 SiOSiH 3 , dominated by elimination and polymerization of transient silanone H 2 Si=O and yielding silane and hydrogen as side-products, represents a convenient process for chemical vapour deposition of poly(hydridosiloxane) films.

📜 SIMILAR VOLUMES

Perhydridosilicone films produced by IR

Perhydridosilicone films produced by IR laser-induced chemical vapour deposition from disiloxane

✍ Josef Pola; Zdenĕk Bastl; Markéta Urbanová; Jan S̆ubrt; Helmut Beckers 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 260 KB

Solid perhydridosilicone films have been produced by transversely excited atmospheric (TEA) and continuous-wave CO 2 laser-induced gas-phase decompositions of H 3 SiOSiH 3 controlled by elimination and polymerization of transient silanone H 2 Si=O and affording silane and hydrogen as side products.

UV-laser-induced photolysis of trimethyl

UV-laser-induced photolysis of trimethyl(vinyloxy)silane for chemical vapour deposition of polysiloxane films

✍ Akihiko Ouchi; Yoshinori Koga; Zdeněk Bastl; Josef Pola 📂 Article 📅 1999 🏛 John Wiley and Sons 🌐 English ⚖ 280 KB 👁 1 views

The UV-induced photolysis of trimethyl(vinyloxy)silane (TMVSi) induced by ArF laser, affording a multitude of unsaturated hydrocarbons and a solid polydimethylsiloxane, represents a convenient process of chemical vapour deposition in which the silicon of the parent is almost completely utilized for