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Atomic layer deposition of polycrystalline HfO2 films by the HfI4–O2 precursor combination

✍ Scribed by J. Sundqvist; A. Hårsta; J. Aarik; K. Kukli; A. Aidla

Book ID
108388551
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
130 KB
Volume
427
Category
Article
ISSN
0040-6090

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