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Atomic Layer Deposition of HfO2 Thin Films Employing a Heteroleptic Hafnium Precursor

✍ Scribed by Ke Xu; Andrian P. Milanov; Harish Parala; Christian Wenger; Canan Baristiran-Kaynak; Kaoutar Lakribssi; Teodor Toader; Claudia Bock; Detlef Rogalla; Hans-Werner Becker; Ulrich Kunze; Anjana Devi

Publisher: John Wiley and Sons
Year: 2012
Tongue: English
Weight: 842 KB
Volume: 18
Category: Article
ISSN: 0948-1907
DOI: 10.1002/cvde.201106934

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