ChemInform Abstract: Atomic Layer Deposition of Tantalum Oxide Thin Films from Iodide Precursor.

✍ Scribed by Kaupo Kukli; Jaan Aarik; Aleks Aidla; Katarina Forsgren; Jonas Sundqvist; Anders Haarsta; Teet Uustare; Hugo Maendar; Alma-Asta Kiisler

• Publisher: John Wiley and Sons
• Year: 2001
• Weight: 31 KB
• Volume: 32
• Category: Article
• ISSN: 0931-7597
• DOI: 10.1002/chin.200119205