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ChemInform Abstract: Controlled Growth of TaN, Ta3N5, and TaOxNy Thin Films by Atomic Layer Deposition.

✍ Scribed by Mikko Ritala; Pia Kalsi; Diana Riihelae; Kaupo Kukli; Markku Leskelae; Janne Jokinen

No coin nor oath required. For personal study only.

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