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Cyclic Atomic Layer Deposition of Hafnium Aluminate Thin Films Using Tetrakis(diethylamido)hafnium, Trimethyl Aluminum, and Water

✍ Scribed by S.-H. Kim; S.-W. Rhee

Publisher: John Wiley and Sons
Year: 2006
Tongue: English
Weight: 329 KB
Volume: 12
Category: Article
ISSN: 0948-1907
DOI: 10.1002/cvde.200506371

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