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AIP Conference Proceedings [AIP ION IMPLANTATION TECHNOLOGY 2012: Proceedings of the 19th International Conference on Ion Implantation Technology - Valladolid, Spain (25–29 June 2012)] - Electrical characterization of {311} defects and related junction leakage currents in n-type Si after ion implantation

✍ Scribed by Nyamhere, C.; Cristiano, F.; Olivie, F.; Bedel-Pereira, E.; Boucher, J.; Essa, Z.; Bolze, D.; Yamamoto, Y.

No coin nor oath required. For personal study only.

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