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AIP Conference Proceedings [AIP ION IMPLANTATION TECHNOLOGY 2012: Proceedings of the 19th International Conference on Ion Implantation Technology - Valladolid, Spain (25–29 June 2012)] - TCAD simulation of the co-implantation species C, F, and N in MOS transistors

✍ Scribed by Bazizi, E. M.; Mok, K. R. C.; Benistant, F.; Yeong, S. H.; Teo, R. S.; Zechner, C.


Book ID
118066842
Publisher
AIP
Year
2012
Weight
865 KB
Category
Article

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