Amorphous TiO x N y films of varying stoichiometry have been deposited on Si and Cu substrates using ionassisted deposition (IAD). The structure of the films and the effects of annealing in the 200-450 Β°C range have been examined. Secondary ion mass spectrometry (SIMS) has been used to investigate
XPS and SIMS depth profiling of oxynitrides
β Scribed by L. Vanzetti; M. Bersani; M. Sbetti; M. Anderle
- Publisher
- John Wiley and Sons
- Year
- 2000
- Tongue
- English
- Weight
- 79 KB
- Volume
- 30
- Category
- Article
- ISSN
- 0142-2421
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