Characterization of titanium hydride films covered by nanoscale evaporated Au layers: ToF-SIMS, XPS and AES depth profile analysis
✍ Scribed by Lisowski, W.; van den Berg, A. H. J.; Leonard, D.; Mathieu, H. J.
- Publisher
- John Wiley and Sons
- Year
- 2000
- Tongue
- English
- Weight
- 98 KB
- Volume
- 29
- Category
- Article
- ISSN
- 0142-2421
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✦ Synopsis
Thin titanium hydride (TiH y ) films, covered by ultrathin gold layers, have been compared with the corresponding titanium films after analysis using a combination of time-of-flight SIMS (ToF-SIMS), XPS and AES. The TiH y layers were prepared under UHV conditions by precisely controlled hydrogen sorption at 298 K on Ti film evaporated onto a glass substrate. Both Ti and TiH y films were then covered in situ by a nanoscale Au layer. Analyses were performed in separate systems after long-term exposure of the films to air. The thin gold layers covering the Ti and TiH y surfaces prevent any extensive air interaction with both films, allowing characterization of the bulk Ti and TiH y layers ex situ, even after a long-term application in air. The chemical nature of the TiH y layers has been analysed after sputtering of the Au top layer. The high-mass-resolution positive-ion ToF-SIMS spectra disclosed only one peak at mass 49 ( 49 Ti Y ) for the Ti and two peaks at mass 49 ( 49 Ti Y and 48 TiH Y ) for the TiH y film, reflecting a difference in hydrogen concentration. Analysis of the features of the Ti Auger spectra during the sputter profile measurements allows the TiH y to be distinguished and characterized in the bulk region of the Au/TiH y layer. Besides TiH y , TiO and TiOH were detected by XPS to be the main chemical compounds in the interface region of the Au/TiH y film.