Vacancies in CZ silicon crystals observed by low-temperature ultrasonic measurements
β Scribed by Hiroshi Yamada-Kaneta; Terutaka Goto; Yuichi Nemoto; Koji Sato; Masatoshi Hikin; Yasuhiro Saito; Shintaro Nakamura
- Publisher
- Elsevier Science
- Year
- 2007
- Tongue
- English
- Weight
- 429 KB
- Volume
- 401-402
- Category
- Article
- ISSN
- 0921-4526
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π SIMILAR VOLUMES
Vacancy concentration distribution is estimated by measuring deep levels induced by N -vacancy complexes in the wafers 2 which are prepared from Si crystals grown by different pulling rate. It is found that the vacancy concentration is very low inside the OSF-ring and a little low in the ring region
## Abstract Solutionβbased nickel induced crystallization of amorphous silicon (aβSi) films was performed. The nickel solution was prepared by dissolving (CH~3~CO~2~)~2~Ni in deionized water and applied uniformly on aβSi films by lowβcost ultrasonic spray pyrolysis method. Crystallization could be