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Use of alloy systems in the epitaxial growth of silicon

✍ Scribed by S. Nielsen


Publisher
Elsevier Science
Year
1965
Tongue
English
Weight
113 KB
Volume
15
Category
Article
ISSN
0042-207X

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Selective epitaxial growth of silicon in
✍ M. Kastelic; I. Oh; C.G. Takoudis; J.A. Friedrich; G.W. Neudeck πŸ“‚ Article πŸ“… 1988 πŸ› Elsevier Science 🌐 English βš– 461 KB

Selective epitaxial growth (SEG) of silicon opens new avenues in electronic device design by allowing vertical (three dimensional) integrated circuits to be fabricated and isolation between devices to be vastly improved. In this work selective epitaxial silicon deposition is performed in an RF-heate