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Growth of oxygen-doped silicon epitaxial films by co-evaporation of silicon and SiO in a molecular beam epitaxial system

✍ Scribed by Wei-Xin Ni; György Radnoczi; Göran V. Hansson


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
830 KB
Volume
184
Category
Article
ISSN
0040-6090

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The value of in situ monitoring to study growth dynamics and surface reaction kinetics in a gas source molecular beam epitaxy process is illustrated with reference to the growth of Si ®lms on Si(001) substrates using a beam of disilane (Si 2 H 6 ). By using a combination of re¯ection high-energy ele