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Electrical properties of gallium- and antimony-doped silicon layers, grown by solid phase epitaxy in a molecular beam epitaxial growth chamber

✍ Scribed by A. Casel; H. Kibbel; F. Schäffler


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
282 KB
Volume
183
Category
Article
ISSN
0040-6090

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