✦ LIBER ✦

Uniformity of internal linear-type inductively coupled plasma source for flat panel display processing

✍ Scribed by Lim, Jong Hyeuk; Kim, Kyong Nam; Park, Jung Kyun; Lim, Jong Tae; Yeom, Geun Young

Book ID: 121334562
Publisher: American Institute of Physics
Year: 2008
Tongue: English
Weight: 509 KB
Volume: 92
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.2840997

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Scalable internal linear double comb-typ

Scalable internal linear double comb-type inductively coupled plasma source for large area flat panel display processing

✍ Kyong Nam Kim; Jong Hyeuk Lim; Jung Kyun Park; Geun Young Yeom 📂 Article 📅 2008 🏛 Elsevier Science 🌐 English ⚖ 685 KB

Study of Internal Linear Inductively Cou

Study of Internal Linear Inductively Coupled Plasma Source for Ultra Large-Scale Flat Panel Display Processing

✍ Jong Hyeuk Lim; Kyong Nam Kim; Gwang Ho Gweon; Jae Beom Park; Geun Young Yeom 📂 Article 📅 2009 🏛 Springer 🌐 English ⚖ 243 KB

Low-impedance internal linear inductive

Low-impedance internal linear inductive antenna for large-area flat panel display plasma processing

✍ Kim, K. N.; Jung, S. J.; Lee, Y. J.; Yeom, G. Y.; Lee, S. H.; Lee, J. K. 📂 Article 📅 2005 🏛 American Institute of Physics 🌐 English ⚖ 421 KB

Linear inductive antenna design for larg

Linear inductive antenna design for large area flat panel display plasma processing

✍ K.N. Kim; J.H. Lim; H.B. Jeong; G.Y. Yeom; S.H. Lee; J.K. Lee 📂 Article 📅 2012 🏛 Elsevier Science 🌐 English ⚖ 900 KB

Internal linear inductively coupled plas

Internal linear inductively coupled plasma (ICP) sources for large area FPD etch process applications

✍ Y.J. Lee; K.N. Kim; B.K. Song; G.Y. Yeom 📂 Article 📅 2002 🏛 Elsevier Science 🌐 English ⚖ 250 KB

A large area (830 mm Â 1020 mm) inductively coupled plasma source with a six internal straight antennas was developed for large area FPD (Flat Panel Display) etch process applications and the effects of magnetic fields employing permanent magnets on the plasma characteristics were investigated. Usin

Large-area low-damage plasma sources dri

Large-area low-damage plasma sources driven by multiple low-inductance-antenna modules for next-generation flat-panel display processes

✍ Yuichi Setsuhara; Kosuke Takenaka; Akinori Ebe 📂 Article 📅 2008 🏛 Elsevier Science 🌐 English ⚖ 725 KB