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Linear inductive antenna design for large area flat panel display plasma processing

โœ Scribed by K.N. Kim; J.H. Lim; H.B. Jeong; G.Y. Yeom; S.H. Lee; J.K. Lee


Book ID
113797888
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
900 KB
Volume
89
Category
Article
ISSN
0167-9317

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A large area (830 mm ร‚ 1020 mm) inductively coupled plasma source with a six internal straight antennas was developed for large area FPD (Flat Panel Display) etch process applications and the effects of magnetic fields employing permanent magnets on the plasma characteristics were investigated. Usin