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Scalable internal linear double comb-type inductively coupled plasma source for large area flat panel display processing

โœ Scribed by Kyong Nam Kim; Jong Hyeuk Lim; Jung Kyun Park; Geun Young Yeom


Book ID
108278451
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
685 KB
Volume
202
Category
Article
ISSN
0257-8972

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Internal linear inductively coupled plas
โœ Y.J. Lee; K.N. Kim; B.K. Song; G.Y. Yeom ๐Ÿ“‚ Article ๐Ÿ“… 2002 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 250 KB

A large area (830 mm ร‚ 1020 mm) inductively coupled plasma source with a six internal straight antennas was developed for large area FPD (Flat Panel Display) etch process applications and the effects of magnetic fields employing permanent magnets on the plasma characteristics were investigated. Usin