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Study of Internal Linear Inductively Coupled Plasma Source for Ultra Large-Scale Flat Panel Display Processing

โœ Scribed by Jong Hyeuk Lim; Kyong Nam Kim; Gwang Ho Gweon; Jae Beom Park; Geun Young Yeom


Book ID
106490990
Publisher
Springer
Year
2009
Tongue
English
Weight
243 KB
Volume
29
Category
Article
ISSN
0272-4324

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Internal linear inductively coupled plas
โœ Y.J. Lee; K.N. Kim; B.K. Song; G.Y. Yeom ๐Ÿ“‚ Article ๐Ÿ“… 2002 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 250 KB

A large area (830 mm ร‚ 1020 mm) inductively coupled plasma source with a six internal straight antennas was developed for large area FPD (Flat Panel Display) etch process applications and the effects of magnetic fields employing permanent magnets on the plasma characteristics were investigated. Usin