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Low-impedance internal linear inductive antenna for large-area flat panel display plasma processing

โœ Scribed by Kim, K. N.; Jung, S. J.; Lee, Y. J.; Yeom, G. Y.; Lee, S. H.; Lee, J. K.


Book ID
121679971
Publisher
American Institute of Physics
Year
2005
Tongue
English
Weight
421 KB
Volume
97
Category
Article
ISSN
0021-8979

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Internal linear inductively coupled plas
โœ Y.J. Lee; K.N. Kim; B.K. Song; G.Y. Yeom ๐Ÿ“‚ Article ๐Ÿ“… 2002 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 250 KB

A large area (830 mm ร‚ 1020 mm) inductively coupled plasma source with a six internal straight antennas was developed for large area FPD (Flat Panel Display) etch process applications and the effects of magnetic fields employing permanent magnets on the plasma characteristics were investigated. Usin