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Ultra-shallow junctions produced by plasma doping and flash lamp annealing

โœ Scribed by Wolfgang Skorupa; Rossen A. Yankov; Wolfgang Anwand; Matthias Voelskow; Thoralf Gebel; Daniel F. Downey; Edwin A. Arevalo

Book ID
103843142
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
100 KB
Volume
114-115
Category
Article
ISSN
0921-5107

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Ultra-shallow junction formation by spik
Ultra-shallow junction formation by spike annealing in a lamp-based or hot-walled rapid thermal annealing system: effect of ramp-up rate
โœ Aditya Agarwal; Anthony T. Fiory; Hans-Joachim L. Gossmann; Conor S. Rafferty; P ๐Ÿ“‚ Article ๐Ÿ“… 1998 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 228 KB

Ultra-shallow p-type junction formation has been investigated using 10508C spike anneals in lamp-based and hotwalled rapid thermal processing (RTP) systems. A spike anneal may be characterized by a fast ramp-up to temperature with only a fraction of a second soak-time at temperature. The eects of th