This paper reviews and discusses the error factors in quantitative total reflection x-ray fluorescence analysis, primarily with regard to the surface contamination of silicon wafers. The error factors were classified into three origins: instrumental, sample and data processing. The instrumental erro
✦ LIBER ✦
Total reflection X-ray fluorescence in the ultramicro analysis of artists' pigments
✍ Scribed by Luc Moens; Wim Devos; Reinhold Klockenkämper; Alex von Bohlen
- Publisher
- Elsevier Science
- Year
- 1994
- Tongue
- English
- Weight
- 844 KB
- Volume
- 13
- Category
- Article
- ISSN
- 0165-9936
No coin nor oath required. For personal study only.
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## Total Reflection X-ray Fluorescence (TXRF) is a variant of Energy dispersive X-ray Fluorescence (EDXRF). It is a comparatively new method of trace element analysis and finds its application in various research areas of material development and processing. The versatility of TXRF is due to (i.) r