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ToF-SIMS and AFM studies of low-k dielectric etching in fluorocarbon plasmas

✍ Scribed by P. Lazzeri; X. Hua; G. Oehrlein; E. Iacob; M. Barozzi; M. Bersani; M. Anderle

Book ID: 103818055
Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 230 KB
Volume: 252
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2006.02.104

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