Etching of Silicon and Silicon Dioxide in Dense Low-Pressure Inductively Coupled Radiofrequency Discharge Fluorocarbon Plasmas

✍ Scribed by I. I. Amirov; M. O. Izyumov; O. V. Morozov

• Book ID: 111553082
• Publisher: SP MAIK Nauka/Interperiodica
• Year: 2003
• Tongue: English
• Weight: 128 KB
• Volume: 37
• Category: Article
• ISSN: 0018-1439
• DOI: 10.1023/a:1025709131169