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Thickness of a modified surface layer formed in a silsesquioxane-based low-k material during etching in a fluorocarbon plasma

✍ Scribed by Sung-Wook Hwang; Gyeo-Re Lee; Jae-Ho Min; Sang Heup Moon


Book ID
110643716
Publisher
Springer US
Year
2003
Tongue
English
Weight
158 KB
Volume
20
Category
Article
ISSN
0256-1115

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