ChemInform Abstract: A Review of SiO2 Etching Studies in Inductively Coupled Fluorocarbon Plasmas

✍ Scribed by Marc Schaepkens; Gottlieb S. Oehrlein

• Publisher: John Wiley and Sons
• Year: 2010
• Weight: 28 KB
• Volume: 32
• Category: Article
• ISSN: 0931-7597
• DOI: 10.1002/chin.200126238

✦ Synopsis

Abstract

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