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Mechanistic studies of the initial stages of etching of Si and SiO2 in a CHF3 plasma

✍ Scribed by Ch. Cardinaud; G. Turban

Publisher: Elsevier Science
Year: 1990
Tongue: English
Weight: 967 KB
Volume: 45
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(90)90061-4

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