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Etching of SiO2 in SF6 plasmas: the role of ions and electrons in etching mechanisms

✍ Scribed by B Petit; A Durandet; J Pelletier

Publisher: Elsevier Science
Year: 1986
Tongue: English
Weight: 258 KB
Volume: 36
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(86)90114-4

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