Etching of SiO2 in SF6 plasmas: the role of ions and electrons in etching mechanisms : B. Petit, A. Durandet and J. Pelletier. Vacuum36(11/12), 799 (1986)

• Publisher: Elsevier Science
• Year: 1987
• Tongue: English
• Weight: 129 KB
• Volume: 27
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(87)90169-7