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Spectroscopic studies of fluorescent emission in plasma etching of Si and SiO2 and the mechanism of gas-surface interactions : D. Field, A. J. Hydes and D. F. Klemperer. Vacuum 34 (5), 563 (1984)


Publisher
Elsevier Science
Year
1984
Tongue
English
Weight
255 KB
Volume
24
Category
Article
ISSN
0026-2714

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