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(TiAlV)N1−x thin films deposited by reactive sputtering: chemical composition

✍ Scribed by O. Asturizaga; R. Sanjinés; G. Margaritondo; F. Lévy

Book ID: 107930285
Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 626 KB
Volume: 61
Category: Article
ISSN: 0257-8972
DOI: 10.1016/0257-8972(93)90198-w

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