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Stoichiometric SiO2 thin films deposited by reactive sputtering

✍ Scribed by I. Radović; Y. Serruys; Y. Limoge; N. Bibić; S. Poissonnet; O. Jaoul; M. Mitrić; N. Romčević; M. Milosavljević

Book ID
113782153
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
329 KB
Volume
104
Category
Article
ISSN
0254-0584

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