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Oxynitride perovskite LaTiOxNy thin films deposited by reactive sputtering

✍ Scribed by C. Le Paven-Thivet; L. Le Gendre; J. Le Castrec; F. Cheviré; F. Tessier; J. Pinel


Book ID
116847821
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
755 KB
Volume
35
Category
Article
ISSN
0079-6786

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Nickel oxide (NiO) thin films were deposited by dc reactive magnetron sputtering Ni in an Ar+O, mixed atmosphere at room temperature on unheated Si substrates. The oxygen content in the gas was varied from 10 to 50% and its effect on the deposition rate, structural, composition and electrical proper