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Dielectric oxynitride LaTiOxNy thin films deposited by reactive radio-frequency sputtering

✍ Scribed by A. Ziani; C. Le Paven-Thivet; D. Fasquelle; L. Le Gendre; R. Benzerga; F. Tessier; F. Cheviré; J.C. Carru; A. Sharaiha

No coin nor oath required. For personal study only.

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