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Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process

✍ Scribed by Jean-Marie Chappé; Nicolas Martin; Jan Lintymer; Fabrice Sthal; Guy Terwagne; Jamal Takadoum

Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
270 KB
Volume
253
Category
Article
ISSN
0169-4332

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