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Preparation of titanium oxynitride thin films by reactive sputtering using air/Ar mixtures

✍ Scribed by Mu-Hsuan Chan; Fu-Hsing Lu


Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
855 KB
Volume
203
Category
Article
ISSN
0257-8972

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Thin films of titanium hydride were obtained by reactive cathodic sputtering with a titanium target using different compositions of a mixture of hydrogen and argon as sputtering gas. The layered material is quite different from the bulk material: only a poorly crystallized phase with formula Till,.