Synthesis and characterization of titanium hydride thin films obtained by reactive cathodic sputtering
β Scribed by G. Meunier; J.P. Manaud; P. Grall
- Publisher
- Elsevier Science
- Year
- 1993
- Tongue
- English
- Weight
- 354 KB
- Volume
- 18
- Category
- Article
- ISSN
- 0921-5107
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β¦ Synopsis
Thin films of titanium hydride were obtained by reactive cathodic sputtering with a titanium target using different compositions of a mixture of hydrogen and argon as sputtering gas. The layered material is quite different from the bulk material: only a poorly crystallized phase with formula Till,. 7 was synthesized at room temperature for all the gas mixtures investigated. The density measured by Rutherford backscattering spectrometry and X-ray absorption is slightly lower than that of the bulk hydride. These titanium hydride films can be used as a binding compound in metal-ceramic brazing.
π SIMILAR VOLUMES
The contact properties of ZrN x on p-type Si obtained by magnetron reactive sputtering were investigated. Schottky diode characteristics were observed as determined by forward current-voltage (I-V) and capacitance-voltage (C-V) measurements. The zerobias barrier heights evaluated by I-V were in the